SOITEC and Silian jointly develop GaN wafers to improve LED production efficiency

SOITEC, a semiconductor material manufacturer and manufacturer in the electronics and energy industries, and Chongqing Silian Optoelectronics Technology Co., Ltd., a supplier of materials, equipment and systems for the lighting industry, have reached an agreement on the use of HVPE technology to manufacture gallium nitride (GaN). GaN wafer stencils can significantly reduce costs in the production of LEDs.

The cooperative development agreement between the two parties aims to verify the feasibility and commercial production of GaN wafer template production using quadruple sapphire substrates and SOITEC's unique HVPE technology. Both parties plan to start sample production of GaN wafer templates this year.

SOITEC said that they are planning to use a proven silicon epitaxial device to develop a high-capacity HVPE device after adding the gallium gas they developed, and to develop a process with rapid growth characteristics to reduce costs. This new process makes GaN stencils more cost effective than using MOVPE.

At the same time, SOITEC said that the development of HVPE technology has introduced a new business model that allows LED manufacturers to save up to 60% of MOVPE capacity. In addition to this new business model, SOITEC is also looking for collaboration with Quad-Link in the field of LED lighting, leveraging the experience of LED epitaxial growth from Arizona's Phoenix Labs affiliates.

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